Journal of Micro/Nanolithography MEMS and MOEMS
译名:微纳光刻、MEMS与MOEMS杂志
Journal of Micro-Nanolithography MEMS and MOEMS
SCIEJCR Q3中科院3区
1-3
2026
影响因子区间
—
平台估算
投稿周期
21%
2025
中国作者发文占比
3150 CHF
费用说明
ⓘ
收费
期刊简介:The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microelectromechanical systems, micro-optoelectromechanical systems, and photonics industries.
【译文】《微纳光刻、MEMS和MOEMS杂志》(JM3)发表同行评审的论文,涉及光刻、制造、封装和集成技术,这些技术对于满足电子、微机电系统、微光机电系统和光子工业的需求至关重要。
出版社
SPIE
语言
English
学科
—
ISSN
1932-5150
eISSN
1932-5134
出版频率
季刊
创刊年份
2007
投稿网址
https://jm3.msubmit.net/cgi-bin/main.plex
最近更新
2026-04-02 18:16:40

| 指标 | 当前值 | 近三年趋势 |
|---|---|---|
| JCR分区 | Q3 | 暂无 |
| 中科院分区 | 3区 | 暂无 |
| 影响因子区间 | 1-3 | 暂无 |