Journal of Micro/Nanolithography MEMS and MOEMS

译名:微纳光刻、MEMS与MOEMS杂志

Journal of Micro-Nanolithography MEMS and MOEMS

SCIEJCR Q3中科院3区

1-3

2026

影响因子区间

平台估算

投稿周期

21%

2025

中国作者发文占比

3150 CHF

费用说明

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期刊简介:The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microelectromechanical systems, micro-optoelectromechanical systems, and photonics industries.

【译文】《微纳光刻、MEMS和MOEMS杂志》(JM3)发表同行评审的论文,涉及光刻、制造、封装和集成技术,这些技术对于满足电子、微机电系统、微光机电系统和光子工业的需求至关重要。

出版社
SPIE
语言
English
学科
ISSN
1932-5150
eISSN
1932-5134
出版频率
季刊
创刊年份
2007
投稿网址
https://jm3.msubmit.net/cgi-bin/main.plex
最近更新
2026-04-02 18:16:40
Journal of Micro/Nanolithography MEMS and MOEMS

指标当前值近三年趋势
JCR分区Q3
暂无
中科院分区3区
暂无
影响因子区间1-3
暂无