Recent Patents on Nanotechnology

译名:纳米技术最新专利

EISCIEJCR Q3中科院4区

1-3

2026

影响因子区间

平台估算

投稿周期

15%

2025

中国作者发文占比

3150 CHF

费用说明

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期刊简介:Recent Patents on Nanotechnology publishes full-length/mini reviews and research articles that reflect or deal with studies in relation to a patent, application of reported patents in a study, discussion of comparison of results regarding application of a given patent, etc., and also guest edited thematic issues on recent patents in the field of nanotechnology. A selection of important and recent patents on nanotechnology is also included in the journal. The journal is essential reading for all researchers involved in nanotechnology.

【译文】近期纳米技术专利发布全面/简短综述和研究文章,反映或处理与专利相关的专利研究,报告专利在研究中的应用,讨论给定专利应用结果的比较等,还包括纳米技术领域近期专利的专题特刊。该期刊还包括纳米技术领域重要且近期的专利选择。对于所有从事纳米技术研究的研究人员来说,这是必读的。

出版社
Bentham Science Publishers
语言
English
学科
材料科学
ISSN
1872-2105
eISSN
2212-4020
出版频率
3期/年
创刊年份
2007
投稿网址
http://bsp-cms.eurekaselect.com/index.php/NANOTEC/login?source=%2Findex.php%2FNANOTEC
最近更新
2026-04-02 18:16:40

指标当前值近三年趋势
JCR分区Q3
暂无
中科院分区4区
暂无
影响因子区间1-3
暂无