EISCIEJCR Q3中科院4区
1-3
2026
影响因子区间
—
平台估算
投稿周期
15%
2025
中国作者发文占比
3150 CHF
费用说明
ⓘ
收费
期刊简介:Recent Patents on Nanotechnology publishes full-length/mini reviews and research articles that reflect or deal with studies in relation to a patent, application of reported patents in a study, discussion of comparison of results regarding application of a given patent, etc., and also guest edited thematic issues on recent patents in the field of nanotechnology. A selection of important and recent patents on nanotechnology is also included in the journal. The journal is essential reading for all researchers involved in nanotechnology.
【译文】近期纳米技术专利发布全面/简短综述和研究文章,反映或处理与专利相关的专利研究,报告专利在研究中的应用,讨论给定专利应用结果的比较等,还包括纳米技术领域近期专利的专题特刊。该期刊还包括纳米技术领域重要且近期的专利选择。对于所有从事纳米技术研究的研究人员来说,这是必读的。
出版社
Bentham Science Publishers
语言
English
学科
材料科学
ISSN
1872-2105
eISSN
2212-4020
出版频率
3期/年
创刊年份
2007
投稿网址
http://bsp-cms.eurekaselect.com/index.php/NANOTEC/login?source=%2Findex.php%2FNANOTEC
最近更新
2026-04-02 18:16:40
| 指标 | 当前值 | 近三年趋势 |
|---|---|---|
| JCR分区 | Q3 | 暂无 |
| 中科院分区 | 4区 | 暂无 |
| 影响因子区间 | 1-3 | 暂无 |