Russian Microelectronics

期刊简介：Russian Microelectronics  covers physical, technological, and some VLSI and ULSI circuit-technical aspects of microelectronics and nanoelectronics; it informs the reader of new trends in submicron optical, x-ray, electron, and ion-beam lithography technology; dry processing techniques, etching, doping; and deposition and planarization technology. Significant space is devoted to problems arising in the application of proton, electron, and ion beams, plasma, etc. Consideration is given to new equipment, including cluster tools and control in situ and submicron CMOS, bipolar, and BICMOS technologies. The journal publishes papers addressing problems of molecular beam epitaxy and related processes; heterojunction devices and integrated circuits; the technology and devices of nanoelectronics; and the fabrication of nanometer scale devices, including new device structures, quantum-effect devices, and superconducting devices. The reader will find papers containing news of the diagnostics of surfaces and microelectronic structures, the modeling of technological processes and devices in micro- and nanoelectronics, including nanotransistors, and solid state qubits.

【译文】俄罗斯微电子学涵盖了微电子和纳米电子学的物理、技术和一些VLSI和ULSI电路技术方面；向读者介绍亚微米光学、X射线、电子和离子束光刻技术的新趋势；干法加工技术、蚀刻、掺杂；以及沉积和平面化技术。期刊着重讨论了质子、电子和离子束、等离子体等在应用中产生的问题。还考虑了包括簇工具和现场及亚微米CMOS、双极型和BICMOS技术在内的新设备。期刊发表关于分子束外延和相关工艺、异质结器件和集成电路、纳米电子技术和纳米尺度器件制造（包括新型器件结构、量子效应器件和超导器件）的论文。读者将找到有关表面和微电子结构诊断、微电子和纳米电子学中工艺和器件建模（包括纳米晶体管）以及固态量子比特的论文。