Integrated ferroelectrics

译名:集成铁电体

INTEGRATED FERROELECTRICS

EISCIEJCR Q4

<1

2026

影响因子区间

平台估算

投稿周期

3%

2025

中国作者发文占比

£3490.00 GBP / $5090.00 USD / €3990.00 EUR.

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期刊简介:Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.

【译文】《集成铁电》为电子工程师、物理学家以及涉及集成铁电器件的研究、设计、开发、制造和利用的工艺和系统工程师、陶瓷学家和化学家提供了一个国际、跨学科的论坛。这些器件将铁电薄膜与半导体集成电路芯片相结合。结果是产生了一类新型电子器件,它们将铁电材料的独特非易失性存储、热释电、压电、光折射、辐射硬化、声学和/或介电特性与半导体i.c.技术的动态存储、逻辑和/或放大特性以及小型化和低成本优势相结合。

出版社
Taylor & Francis
语言
English
学科
工程技术
ISSN
1026-7530
eISSN
1607-8489
出版频率
月刊
创刊年份
1959
投稿网址
http://www.tandfonline.com/action/authorSubmission?journalCode=ginf20&page=instructions
最近更新
2026-04-02 18:16:40
Integrated ferroelectrics

指标当前值近三年趋势
JCR分区Q4
暂无
影响因子区间<1
暂无