Plasma Chemistry and Plasma Processing

译名:等离子体化学与等离子体处理

PLASMA CHEMISTRY AND PLASMA PROCESSING

EISCIEJCR Q1中科院3区

3-5

2026

影响因子区间

121天

平台估算

投稿周期

29%

2025

中国作者发文占比

费用说明

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期刊简介:Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

【译文】发表关于等离子体化学和等离子体加工的基础和应用研究的原创论文,该期刊的范围包括从非热等离子体到热等离子体的加工等离子体,以及基本的等离子体研究以及特定等离子体应用的研究。这些应用包括但不限于等离子体催化、环境处理包括液体和气体的处理、等离子体在生物领域的应用包括等离子体医学和农业、表面改性沉积、粉末和纳米结构合成、能源应用包括等离子体燃烧和重整、资源回收、等离子体与电化学的结合以及等离子体刻蚀。还欢迎对等离子体中的化学动力学以及等离子体与表面的相互作用的研究。

出版社
Springer Science+Business Media
语言
English
学科
物理与天体物理
ISSN
0272-4324
eISSN
1572-8986
出版频率
季刊
创刊年份
1981
投稿网址
https://mc.manuscriptcentral.com/pcpp
最近更新
2026-04-02 18:16:40
Plasma Chemistry and Plasma Processing

指标当前值近三年趋势
JCR分区Q1
暂无
中科院分区3区
暂无
影响因子区间3-5
暂无